2011年1月28日 星期五

20110127實驗室日誌

training STM with May

puming : P= 2.1E-5 mbar
change a new STM Tip (0.5mm)
change STM sample
find some problems with scanner~

20110125實驗室日誌

將SPM stick 以酒精清潔並抽真空
P=4.1E-2 mbar ~ 2.1E-5 mbar
抽真空2天

20110124實驗室日誌

checking pumping:

1. with gauge and valve : P=2.8E-4 mbar ~ 1.4E-5 mbar for 20 mins
2. with tube: P=6.9E-4 mbar ~ 9.7E-6 mbar for30 min
3. with insert: P=8.1E-4 mbar ~ 4.8E-5 mbar for 20 min

20110121實驗室日誌

1. move the SPM system to 1F lab
2. setup TF-AFM mode
3. making TF-AFM Tip and exchange a new one.
4. check the cables, and test TF-AFM mode

cables cap: Axis3: 833nf;Axis2: 894nf;Axis1: 948nf.
低頻雜訊: 0Hz~100Hz: 50mV
Active: 0Hz~100Hz: 160mV
GND之後: 50mV

20110112實驗室日誌

testing AFM mode (contact mode)
sample: GaSb

雜訊情況:
contact 前 0Hz~ 100Hz: 400~500mV
contact 後 0Hz~ 100Hz: 1.5~2V

cable cap: Axis3: 888nf;Axis2: 951nf;Axis1: 1004nf

Parameter:
Scan Range X: 1002 nm
Scan Range Y: 1002 nm
Scan Rotation: 90 deg
Scan Speed: 80 nm/s
Regulator P: 0.003
Regulator I: 18 Hz
Regulator Setpoint: 2.7
Slope Compensation: on
Slope Compensation X: -20 %
Slope Compensation Y: -20 %




20110111實驗室日誌

testing AFM mod
低頻雜訊: 2V
sample: standard sample

Scan Range X: 1002 nm
Scan Range Y: 1002 nm
Scan Rotation: 90 deg
Scan Speed: 50 nm/s
Regulator P: 0.003
Regulator I: 12 Hz
Regulator Setpoint: 2.5










20110110實驗室日誌

1. making STM Tip (0.5mm)
2. check the Tuning fork AFM head

testing the positioner without the sample holder, but still find some noise when approaching, and after try many times, the situation was improved.

2011年1月27日 星期四

20110107實驗室日誌

testing tuning fork AFM
發現: approach時,Z軸會不時有極大且不穩定的雜音出現
將sample取下,cable只接上positioner,持續上升並測試其是否有相同情況

20110106 - 0107實驗室日誌

making Tip with May
diameter: 0.5mm for STM mode

1. making a saturated solution of KOH
2. setup the etching device
3. finging the Vmax
4. decrease V gradually to find the suitable value

20110105實驗室日誌

exchange the new tuning fork
amplitude: 40mV
freg: 32.302897 kHz




20110103實驗室日誌

making TF-AFM Tip (0.05mm)
KOH: 0.57g
DI water 50ml

1. 接觸液面後旋轉微調一圈並下針,將液面下的tip吃斷以控制tip接觸面積(10V,0.001A)
2. 向下旋轉微調一圈,將tip的氧化層侵蝕(5V,0.01A)
3. 將旋轉微調向上兩個刻度,開始蝕刻tip(1.2V,0.001A)